| Overview | Parentpackage |

The concernComposition package abstracts over different composition mechanisms, i.e., asymmetric and symmetric ones.
| Class Summary | |
|---|---|
| ConcernModule | The ConcernModule concept has been defined to subsume the notion of
aspect and base and therefore is specialized with appropriate meta-classes.
The meta-class Aspect is specialized from ConcernModule and
introduced to the AsymmetricConcernComposition package. Moreover,
the WebML meta-class from the WebML language, which
represents a WebML model inherits from ConcernModule as well. For
the asymmetric composition mechanism a ConcernModule of type WebML
then serves as the base. |
| ConcernCompositionRule | A ConcernCompositionRule defines how the various concern elements are to be composed. The general concept of concern composition rule is specialized into sub-classes supporting different composition mechanisms, i.e., the AsymmetricCompositionRule and the SymmetricCompositionRule. |
| CompositionPlan | The CompositionPlan specifies how to integrate a set of
ConcernModules according to a set of ConcernCompositionRules. The
execution of a composition plan results in a composed model i.e.,
a WebML Model. |
| ConcernCompositionRuleSequence | The ConcernCompositionRuleSequence specifies an order for a set of ConcernCompositionRules.
Constraints:
|
| ConcernModuleSequence | The ConcernModuleSequence specifies an order for a set of ConcernModules. Constraints:
|
| ModuleRepository | The ModuleRepository serves as a Repository for ConcernModules and ConcernModuleSequences.
Singleton. |
| RuleRepository | The RuleRepository serves as a Repository for ConcernCompositionRules and ConcernCompositionRuleSequences.
Singleton. |
| aspectWebMLModel | The aspectWebMLModel represents the root element of each aspectWebML project. |
| Enumeration Summary | |
|---|---|
| EffectKind | The effects ConcernCompositionRules can have. |